Materials analytics plays an essential role in the development of epitaxial growth processes and in quality control for epitaxy and device fabrication. Due to fast and direct access to methods such as x-ray diffraction, photoluminescence, electroluminescence, carrier-density profiling, and electron microscopy, FBH is able to develop new epitaxial growth processes within a short time-scale. The rapid feed-back regarding the analysis of layer structures is indispensable for the production of highly complex devices (e. g. laser structures with integrated Bragg grating). Detailed information on structural properties of semiconductor heterostructures after special epitaxial or process steps can be obtained by transmission electron microscopy, developed within a partnership with Humboldt-Universität zu Berlin.
Data from materials analytics are key informations for the quality management in epitaxy. Routine assessment of critical parameters after the exchange of source materials or maintenance of growth systems are the basis for the high quality standard of FBH's products. The analysis of failure causes is essential for further device development and thus helps to push device technology forward.