Application Laboratory Sentech - Dry Etching

Via structure in GaAs
Via structure in GaAs, produced with ICP plasma etching system SI 500

SENTECH Instruments GmbH runs its application laboratory for plasma etching at the FBH in order to further optimize SENTECH's etching systems. The company's process developments are focussed on sophisticated and innovative dry etching processes for III-V semiconductors such as GaAs, InP, GaN and SiC for various applications in micro- and optoelectronics. This includes, for example, fast and therefore productive etching processes on inert and extremely hard materials such as SiC, acting as a substrate for GaN based devices. SENTECH's etching equipment, installed in the FBH clean room, can thus be demonstrated within its real application environment.

The close link to the FBH offers SENTECH the possibility to order technology transfer services, which may trigger future innovations in the field of plasma etching and deposition.

SENTECH

SENTECH Instruments GmbH develops, manufactures, and sells advanced quality instrumentation for Thin Film Metrology (reflectometer, ellipsometer, spectroscopic ellipsometer) and Plasma Process Technology (plasma etcher, plasma deposition systems, customized solutions).