Implantation

The FBH provides its customers with implantation services

Basic parameters

  • Accelerating voltage to 360 keV
  • Wafer size up to 4 "
  • Ion masses up to 250 amu
  • Certified according to ISO 9001, 14001 and 18001

Target groups

  • Supporting your production of high-level components
    • Volumes up to 50 wafers per week
    • Short wafer return times by order processing in a two-shift system
    • Pursuit of a zero-defect approach through computer-system monitoring

  • Research / development / prototyping
    • Implantation of both hour-ions (H +, He +) and "exotic" elements / molecules
    • Sample handling for wafer sizes 2", 3", 4" and special sizes (for example 20 mm x 20 mm square)
    • Customer support with engineering services (simulation bill) and accompanying processes (masks structuring, activation or annealing)

Example

  • Implantation standards for measurement technique
    • Production of SIMS standards on customer matrix material
    • Implantation of single and multiple profiles
    • Procedures for the exact bracket of even extremely small samples