Masks and Reticles

The FBH offers its customers the manufacture of chromium coated masks from quartz using electron beam lithography:

E-beam
Electron beam exposure system Vistec SB251
Cr mask on quartz
Cr mask on quartz
  • Exposure tool
    • Vistec SB251
    • Variable-shaped beam
    • Accelerating voltage: 50 kV
    • Image placement (multipoint alignment): 27 nm max. dev.
    • Overlay accuracy (mask to mean, two-point alignment): 25 nm max. dev.
    • Mask centrality: 150 nm max. dev.
  • Substrates
    • Contact masks for Maskaligner
    • Reticle for projection lithography
    • Masks standard 4",  5" and 6"
    • Antireflective chromium coating, 100 nm thick, wet chemically etched
    • positive resist for high resolution (<1 μm)
    • Negative resist for fast write times
  • CAD formats
    • GDSII
    • DXF (AutoCAD)
    • Conversion ratio 1:1 or other