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Boule-like growth of GaN by HVPE
E. Richter, U. Zeimer, F. Brunner, S. Hagedorn, M. Weyers, and G. Tränkle
Ferdinand-Braun-Institut für Höchstfrequenztechnik, Gustav-Kirchhoff-Strasse 4, 12489 Berlin, Germany
Published in:
phys. stat. sol. (c), vol. 7, no. 1, pp. 28-31 (2010).
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Abstract:
GaN substrates are indispensable for fabrication of blue laser
diodes. Growth and cutting of HVPE grown GaN boules is
currently the most promising route for cost-efficient supply of
2 inch c-plane substrates. But boule lengths and growth rates
are still rather low constricted by formation of cracks and
morphological defects (V-pits). It is shown here that the formation
of morphological defects in HVPE depends on the
growth conditions. The control of their formation allows for
high growth rates of about 500 µm/h with improving material
quality during growth. Using optimized growth parameters a
threading dislocation density of 3x106 cm-2 and narrow line
widths below 100 arcsec of x-ray rocking curves were obtained
for a 3 mm thick GaN layer grown on a GaN/sapphire
template.
PACS:
61.72.Ff, 81.05.Ea, 81.15.Kk
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