Implantation

The FBH provides its customers with implantation services

Basic parameters

• Accelerating voltage to 360 keV
• Wafer size up to 4 "
• Ion masses up to 250 amu
• ISO 9001 certified tool

Target groups

• Supporting your production of high-level components
  • Volumes up to 50 wafers per week
  • Short wafer return times by order processing in a two-shift system
  • Pursuit of a zero-defect approach through computer-system monitoring
  • Certification according to ISO 9001 (quality), 14001 (environmental), and 18001 (occupational safety); qualified supplier for e.g. Osram Semiconductors, Jenoptik Diode Lab, ...
    
    
• Research / development / prototyping
  • Implantation of both hour-ions (H +, He +) and "exotic" elements / molecules
  • Sample handling for wafer sizes 2", 3", 4" and special sizes (for example 20 mm x 20 mm square)
  • Customer support with engineering services (simulation bill) and accompanying processes (masks structuring, activation or annealing)

Example

• Implantation standards for measurement technique
  • Production of SIMS standards on customer matrix material
  • Implantation of single and multiple profiles
  • Procedures for the exact bracket of even extremely small samples