Masks and Reticles

The FBH offers its customers the manufacture of chromium coated masks from quartz using electron beam lithography:

• Exposure plant
  • Vistec ZBA 23
  • Variable shape beam, vector scan, step and repeat
  • 20/40 kV accelerating voltage
  • 50 nm address Grid
    
    
• Substrates
  • Contact masks for Maskaligner
  • Reticle for projection lithography
  • Masks standard 4 "x 4" x 0.09 "and 5" x 5 "x 0.09"
  • Antireflective chromium coating, 100 nm thick, wet chemically etched
  • positive resist for high resolution (<1 μm)
  • Negative resist for fast write times
    
    
• CAD formats
  • GDSII
  • DXF (AutoCAD)
  • Conversion ratio 1:1 or other