Masks and Reticles

The FBH offers its customers the manufacture of chromium coated masks from quartz using electron beam lithography:

• Exposure tool
  • Vistec SB251
  • Variable-shaped beam
  • Accelerating voltage: 50 kV
  • Image placement (multipoint alignment): 27 nm max. dev.
  • Overlay accuracy (mask to mean, two-point alignment): 25 nm max. dev.
  • Mask centrality: 150 nm max. dev.

• Substrates
  • Contact masks for Maskaligner
  • Reticle for projection lithography
  • Masks standard 4 "x 4" x 0.09 "and 5" x 5 "x 0.09"
  • Antireflective chromium coating, 100 nm thick, wet chemically etched
  • positive resist for high resolution (<1 μm)
  • Negative resist for fast write times

• CAD formats
  • GDSII
  • DXF (AutoCAD)
  • Conversion ratio 1:1 or other