Implantation
The FBH provides its customers with implantation services
Basic parameters
- Accelerating voltage to 360 keV
- Wafer size up to 4 "
- Ion masses up to 250 amu
- Certified according to ISO 9001, 14001 and 18001
Target groups
- Supporting your production of high-level components
- Volumes up to 50 wafers per week
- Short wafer return times by order processing in a two-shift system
- Pursuit of a zero-defect approach through computer-system monitoring
- Research / development / prototyping
- Implantation of both hour-ions (H +, He +) and "exotic" elements / molecules
- Sample handling for wafer sizes 2", 3", 4" and special sizes (for example 20 mm x 20 mm square)
- Customer support with engineering services (simulation bill) and accompanying processes (masks structuring, activation or annealing)
Example
- Implantation standards for measurement technique
- Production of SIMS standards on customer matrix material
- Implantation of single and multiple profiles
- Procedures for the exact bracket of even extremely small samples